![revista revista](/system/covers/16975/big/capital_intensity__technology_intensity_and_skill_development_in_Post_China.jpg)
![revista revista](/system/covers/16975/medium/capital_intensity__technology_intensity_and_skill_development_in_Post_China.jpg)
CAPITAL INTENSITY, TECHNOLOGY INTENSITY, AND SKILL DEVELOPMENT IN POST CHINA/WTO MAQUILADORAS
/ .-
Washington, :
American University
,
2008
.-
1vol; 19pp; 25cms
.- ISSN 0305-750X.-
Inglés
Formato electrónico:
Descargar PDF
Signatura:
WORLD DEVELOPMENT,
Nº4 (2008) 541pp-559pp
( revista )